Working Time:9:00-12:00 (AM,Beijing Time)
13:00-17:00(PM, Beijing Time
Monday to Friday
Daken Chemical Limited
Add:No.56 Hongzhuan Road,Jinshui,Zhengzhou,450000,China
Tel:+86-371-55531817
E-mail:info@dakenchem.com
URL:www.dakentech.com
Introduction A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.The process begins by coating a substrate with a light-sensitive organic...
Product name: | 3-isopropyl-1-adamantanecarboxylic acid |
CAS NO.: | 26847-09-6 |
Structure: | |
Synonyms: | 3-isopropyl-1-adamantanecarboxylic acid |
MF: | |
MW: | |
Melting point : | |
Chemical Properties: | White powder |
Purity | 98% |
Capacity: | 500KG /month |
Package | In paper drums /Fluoride drums /iron drums /plastic drums/IBC Tank ,etc. |
Shipment method : | By Sea ,Air ,Courier door to door ,etc. |
Storeage: | Under room temperature ,keep away from direct sun light |
Loading Port : | China any port ,Beijing ,Shanghai ,Hongkong |
Transportation condition: | Shipped as non- dangerous chemicals |
Application: | Analog Semiconductors, Light-Emitting Diodes LEDs, Solar Photovoltaics PV |
Introduction
A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface.
In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed.
In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coating in areas where the mask was not placed.
Based on the chemical structure of photoresists, they can be classified into three types: Photopolymeric, photodecomposing, photocrosslinking photoresist.
Photopolymeric photoresist is a type of photoresist, usually allyl monomer, which could generate free radical when exposed to light, then initiates the photopolymerization of monomer to produce a polymer. Photopolymeric photoresists are usually used for negative photoresist, e.g. methyl methacrylate.
Photopolymerization of methyl methacrylate monomers under UV that resulting into polymer
Photodecomposing photoresist is a type of photoresist that generates hydrophilic products under light. Photodecomposing photoresists are usually used for positive photoresist.
Photolysis of a dizaonaphthoquinone that leads to a much more polar environment, which allows aqueous base to dissolve a Bakelite-type polymer.
Photocrosslinking photoresist is a type of photoresist, which could crosslink chain by chain when exposed to light, to generate an insoluble network. Photocrosslinking photoresist are usually used for negative photoresist.
The Related Products:3-isopropyl-1-adamantanecarboxylic acid CAS NO. 26847-09-6
1. 1,3-Adamantanediol dimethacrylate CAS NO.122066-43-7
2. 2-Bromoadamantane CAS NO.7314-85-4
3. 1-Methyladamantane CAS NO.768-91-2