Introduction A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.The process begins by coating a substrate with a light-sensitive organic...
Product name： | 1-Bromo-3-methyladamantane |
CAS NO.: | 702-77-2 |
Structure： |
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Synonyms: | 1-BROMO-3-METHYLADAMANTANE;1-BroMo-3-Methyl-tricyclo[3.3.1.13,7]decane;1-Methyl-3-broMoadaMantane;NSC 255329 |
MF: | C11H17Br |
MW: | 229.16 |
Boiling point : | 95-97℃ (4 Torr) |
Chemical Properties: | Colourless Liquid |
Purity | 98% |
Capacity: | 500KG /month |
Package | In paper drums /Fluoride drums /iron drums /plastic drums/IBC Tank ,etc. |
Shipment method : | By Sea ,Air ,Courier door to door ,etc. |
Storeage: | Under room temperature ,keep away from direct sun light |
Loading Port : | China any port ,Beijing ,Shanghai ,Hongkong |
Transportation condition: | Shipped as non- dangerous chemicals |
Application: | Analog Semiconductors, Light-Emitting Diodes LEDs, Solar Photovoltaics PV |
Introduction
A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface.
In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed.
In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coating in areas where the mask was not placed.
Based on the chemical structure of photoresists, they can be classified into three types: Photopolymeric, photodecomposing, photocrosslinking photoresist.
Photopolymeric photoresist is a type of photoresist, usually allyl monomer, which could generate free radical when exposed to light, then initiates the photopolymerization of monomer to produce a polymer. Photopolymeric photoresists are usually used for negative photoresist, e.g. methyl methacrylate.
Photopolymerization of methyl methacrylate monomers under UV that resulting into polymer
Photodecomposing photoresist is a type of photoresist that generates hydrophilic products under light. Photodecomposing photoresists are usually used for positive photoresist.
Photolysis of a dizaonaphthoquinone that leads to a much more polar environment, which allows aqueous base to dissolve a Bakelite-type polymer.
Photocrosslinking photoresist is a type of photoresist, which could crosslink chain by chain when exposed to light, to generate an insoluble network. Photocrosslinking photoresist are usually used for negative photoresist.
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