Daken Chemical Limited
Product Categories
    Working Time:9:00-12:00 (AM,Beijing Time)
    13:00-17:00(PM, Beijing Time
    Monday to Friday
    Daken Chemical Limited
    Add:No.9, Inner Ring Road, Zhengzhou, 450000, China
    Tel:+86-371-55531817
    E-mail:info@dakenchem.com
    URL:www.dakentech.com

1-(1,1-Dimethylethoxy)-3-ethenylbenzene CAS NO.105612-79-1

1-(1,1-Dimethylethoxy)-3-ethenylbenzene CAS NO.105612-79-1

Introduction A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.The process begins by coating a substrate with a light-sensitive organic...

Product   name:

1-(1,1-Dimethylethoxy)-3-ethenylbenzene

CAS   NO.:

105612-79-1

Structure:

105612-79-1.jpg

Synonyms:

3-t-butoxystyrene;m-tert-buthoxystyrene;m-tert-butoxystyrene;3-tert-butoxystyrene;1-ethenyl-3-[(2-methylpropan-2-yl)oxy]benzene

MF:

C12H16O

MW:

176.25

Density:

0.933g/cm3

Chemical   Properties:

Clear  colorless liquid

Purity

98%

Capacity:

500KG /month

Package

In  paper drums /Fluoride drums /iron drums /plastic drums/IBC Tank ,etc.

Shipment   method :

By  Sea ,Air ,Courier door to door ,etc.

Storeage:

Under  room temperature ,keep away from direct sun light

Loading Port :

China  any port ,Beijing ,Shanghai ,Hongkong

Transportation   condition:

Shipped  as non- dangerous chemicals

Application:

Analog  Semiconductors, Light-Emitting Diodes LEDs, Solar Photovoltaics PV

 

Introduction

A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface.

image002_副本.jpg


In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed.

 

In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coating in areas where the mask was not placed.

 

Based on the chemical structure of photoresists, they can be classified into three types: Photopolymeric, photodecomposing, photocrosslinking photoresist.

 

Photopolymeric photoresist is a type of photoresist, usually allyl monomer, which could generate free radical when exposed to light, then initiates the photopolymerization of monomer to produce a polymer. Photopolymeric photoresists are usually used for negative photoresist, e.g. methyl methacrylate.

 

 

Photopolymerization of methyl methacrylate monomers under UV that resulting into polymer

Photodecomposing photoresist is a type of photoresist that generates hydrophilic products under light. Photodecomposing photoresists are usually used for positive photoresist.

 

Photolysis of a dizaonaphthoquinone that leads to a much more polar environment, which allows aqueous base to dissolve a Bakelite-type polymer.

Photocrosslinking photoresist is a type of photoresist, which could crosslink chain by chain when exposed to light, to generate an insoluble network. Photocrosslinking photoresist are usually used for negative photoresist.


The Related Products:3-t-butoxystyrene  CAS NO. 105612-79-1

1. 1-Methacryloyloxy-3-adamantanol CAS NO.115372-36-6

2. 3-Hydroxy-1-adamantyl acrylate CAS NO.216581-76-9

3. 3,4-Dihydroxystyrene CAS NO.6053-02-7

Hot Tags: 1-(1,1-dimethylethoxy)-3-ethenylbenzene CAS NO.105612-79-1, China, suppliers, factory
Related Products
I want to leave a message
Contact Us
Address: No.9 , Inner Ring Road, Zhengzhou, 450000, China
Tel: +86-371-55531817
 Fax:+86-371-55531817
 E-mail:inquiry@dakenchem.com
Copyright © Daken Chemical Limited. All Rights Reserved.
Share: